工业极紫外光刻多反射镜光学设计

至此未晚

Design of Multi-Mirror Optics for Industrial Extreme Ultraviolet Lithography
We develop a new method for multi-mirror optics design. The system includes several mirror groups that will be
designed separately to fulfil the designer’s needs. The elements of individual mirror group are all spherical mirrors. The
radii and separations of the all spherical mirror groups can be calculated by three conditions: the pupil-stop condition,
the non-obstruction condition and the conjugate condition. The connected mirror groups could be optimized as a whole
optics by gradual optimization process, and the final optics includes high order aspheric mirrors. The all sphere
structure design method is effective to reduce the load of calculation and evaluation of the configurations. The gradual
optimization method can help the objective achieve high imaging performance smoothly. Finally we got a NA 0.3
EUVL objective, and the mean wavefront error of 0:0287? (RMS) is reached.

提出了一种多镜光学设计的新方法。该系统包括几个镜组，它们将被单独设计以满足设计师的需求。各镜组的元素均为球面镜。所有球面镜组的半径和间隔可由三种条件计算：光瞳-光阑条件、无遮挡条件和共轭条件。通过逐步优化过程，可以将相互连接的镜组作为一个整体进行优化，最终得到的光学系统包括高阶非球面反射镜。全球面结构设计方法有效地减少了构型计算和评估的工作量。渐进式优化方法可以帮助物镜顺利实现高成像性能。最终得到了NA为0.3 EUVL的物镜，其平均波前误差为0：0287λ达到(RMS)。




很经典的一篇文章，机翻稍稍整理了一下，大家一起学习，有问题可以讨论一下